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Extreme Ultraviolet Lithography. From the Topical Meeting, May 1-3, 1996, Boston, Massachusetts. OSA Trends in Optics and Photonics, Volume 4
Glenn D. Kubiak, Don R. Kania (eds.)
/ Optical Society of America 1996
235 pp., Paperback, ex library, else text clean and binding tight. Volumes
Included: 1
ISBN: 1557524351
Subject/Keywords: physics ntt
Item #: 978960
$22.15